Diffusion in materials DIMAT 2000 (int. conf. in materials, Paris, france, July 17/21, 2000)

This book covers, on close to 2000 pages, all aspects of basic and applied diffusion research in all important engineering materials, including metals and intermetallics, elemental and compound semiconductors, amorphous and nanocrystalline materials and oxides. Emphasis is placed on applied research, e.g. hydrogen in metals, oxidation and corrosion, reactive diffusion, phase transformations, surface diffusion, stresses in multilayers and device technology.

Basics in diffusion : solvent and solute diffusion , chemical diffusion and phenomenology. Ab initio methods in diffusion. Intermetallics : defects and atomic mechanisms , tracer diffusion , chemical diffusion and phenomenology. Semiconductors : elemental and devices , compounds. Metallic amorphous quasi-crystalline and liquid systems. Non-metallic amorphous and liquid systems. Oxides. Hydrogen in metals. Diffusion in grain-boundaries. Wetting at grain boundaries and surfaces. Surface diffusion. Stresses multilayers and driven systems. Reactive diffusion. Oxidation and corrosion. Diffusion and phase transformations. Teaching diffusion.