Beam injection assessment of microstructures in semiconductors BIAMS 2000 (solid stat phenomena volumes 78/79)
Langue : Anglais
Auteur : TOMOKAGE
The characterisation of semiconductors is of key importance in preparing and applying semiconductors in industry. The present work deals with theoretical and experimental topics which are related to the assessment of microstructures in semiconductors by means of beam injection and related methods. Scanning electron beam methods have been proved to be highly successful in characterising structures at the nano-scale. Other important topics covered include : Impurity Concentration Mapping, EBIC and OBIC Investigations, Cathodoluminescence, Photoabsorption Spectroscopy, Scanning Capacitance Microscopy, TEM, SEM, and other techniques. The book is a must for laboratories which are engaged in applied research in the area of semiconductor devices and heterostructures.
Date de parution : 07-2001
Ouvrage de 522 p.
24.5x17.2 cm
Thème de Beam injection assessment of microstructures in... :
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